- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 1/92 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof prepared from printing surfaces
Patent holdings for IPC class G03F 1/92
Total number of patents in this class: 9
10-year publication summary
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1
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2
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1
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0
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0
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0
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0
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0
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2
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0
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| 2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
| Owner |
All patents
|
This class
|
|---|---|---|
| Metamaterial Technologies USA, Inc. | 15 |
2 |
| International Business Machines Corporation | 60644 |
1 |
| Eastman Kodak Company | 3444 |
1 |
| Kateeva, Inc. | 376 |
1 |
| Ocean Optics, Inc. | 74 |
1 |
| Rolith, Inc. | 5 |
1 |
| Unist (ulsan National Institute of Science and Technology) | 328 |
1 |
| Future Tech Capital, LLC | 6 |
1 |
| Other owners | 0 |